• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    IMPROVEMENTS IN SENSORS. Modalities of the present invention provide an electromagnetic sensor (400) for detecting a microstructure of a metal target comprising: a magnetic device (410, 420) for providing a magnetic excitation field; a magnetometer (430) to detect a resulting magnetic field induced in a metallic target; and a calibration circuit (450, 551, 552, 553, 554) to generate a calibration magnetic field to calibrate the electromagnetic sensor, where the calibration reference magnetic field is generated by an electric current induced in the calibration circuit by the excitation magnetic field.
    公开号:BR112013027621B1
    申请号:R112013027621-5
    申请日:2012-04-27
    公开日:2020-11-24
    发明作者:Anthony Joseph Peyton；Wuliang Yin；Stephen John Dickinson
    申请人:The University Of Manchester；
    IPC主号:
    专利说明:

    [0001] [001] The modalities of the present invention relate to an apparatus and methods for monitoring the microstructure of a metallic target. Particularly, though not exclusively, some embodiments of the present invention relate to the apparatus and methods for calibrating electromagnetic sensors. Particularly, though not exclusively, some modalities of the invention concern the monitoring of the microstructural formation of a metallic target. ' Background of the technique
    [0002] [002] During metal production processing, such as steel, the rolling of the metal is followed by controlled cooling. During production processing, particularly the cooling process, a microstructure of the metal evolves and results in a final microstructure of the processed metal. The microstructure of the processed metal has an impact on many aspects of the metal's nature, such as tensile strength.
    [0003] [003] Conventional microstructural analysis techniques are destructive and involve removing samples for analysis, for example, from the end of a coil of processed material. This is time-consuming, costly, does not allow continuous monitoring and assesses only a small fraction of the processed material.
    [0004] [004] When the processed material is steel, it is known that electromagnetic technologies can monitor steel phase transformations by detecting the change in ferromagnetic phase due to changes in electrical conductivity and magnetic permeability within the steel. In addition, if a coil is placed in the vicinity of the steel being processed, this results in a change in impedance measurements for the coil because the conductivity and permeability are influenced by the microstructure of the steel. For example, austenite, the stable phase of iron at elevated temperatures, is paramagnetic whereas ferrite, perlite, bainite and martensite from stable low temperature phases are ferromagnetic below the Curie temperature of around 760 ° C. The properties of steel vary greatly with the volume fractions of these phases, which are largely controlled by the cooling rate and alloy content of the steel.
    [0005] [005] However, problems exist in the real-time monitoring of the electromagnetic properties of metals during processing. Many problems result from the environmental conditions associated with metal processing, such as heat, hydration, humidity, etc.
    [0006] [006] It is an objective of the modalities of the invention to at least mitigate one or more of the problems of the prior art. Summary of the Invention
    [0007] [007] According to aspects of the invention, an apparatus and methods are provided as defined in the embodiments.
    [0008] [008] In accordance with an aspect of the invention, an electromagnetic sensor is provided to detect a microstructure of a metallic target comprising: a means for providing a magnetic field; a magnetometer to detect a magnetic field induced in a metallic target; and a calibration circuit to generate a magnetic reference field to calibrate the sensor unit.
    [0009] [009] The electromagnetic sensor can comprise a plurality of calibration circuits. Each of the plurality of calibration circuits can be arranged to generate a magnetic field in a respective frequency range. Each of the plurality of calibration circuits can comprise a respective impedance. One or more calibration circuits may comprise a calibration coil. The electromagnetic sensor can comprise a control means to selectively control the generation of the reference magnetic field. The reference magnetic field can be generated by an electric current induced in the calibration circuit by the magnetic field. The magnetometer can be an induction detector coil or a Hall sensor. The electromagnetic sensor may comprise a magnetic core. The magnetic core can be U-shaped or Η-shaped. The magnetometer can be arranged close to a pole of the nucleus. The means for generating the magnetic field may comprise one or more excitation coils. The electromagnetic sensor may comprise a control unit arranged to determine a calibration period and to selectively activate the calibration circuit during the calibration period. The control unit can be arranged to determine the calibration period based on a detection signal emitted from the magnetometer. The control unit can be arranged to determine the calibration period based on the detection signal emitted from the magnetometer and a predetermined reference level. The control unit may comprise an input for receiving a signal from a production apparatus indicative of a period between the metal targets, in which the control unit is arranged to determine the calibration period based on it. The control unit can be arranged to selectively control a plurality of calibration circuits. The control unit can be arranged to cause each of the plurality of calibration circuits to emit a respective frequency.
    [0010] [0010] In accordance with one aspect of the invention, a method is provided for calibrating an electromagnetic sensor which comprises: providing an excitation magnetic field; cause a calibration circuit to emit a calibration magnetic field; receiving a resulting magnetic field in one or more magnetometers; and determining a calibration of the electromagnetic sensor based on the resulting magnetic field.
    [0011] [0011] The excitation magnetic field can include a waveform of multiple frequencies. The method may comprise causing a plurality of calibration circuits to each emit a calibration magnetic field in a respective frequency range and determining the calibration of the magnetic sensor in each respective frequency range. The method may comprise determining a phase difference between the excitation magnetic field and the resulting magnetic field. The method may comprise determining a calibration period and having the calibration circuit generate the calibration magnetic field during the calibration period. The calibration period can be a period between metal targets. The calibration period can be determined according to an output of one or more magnetometers. The calibration period can be determined based on the output of one or more missing magnetometers in the calibration magnetic field. The calibration period can be determined according to an input received from a production process.
    [0012] [0012] In accordance with an aspect of the invention, a system is provided to monitor a microstructure of a metallic target comprising: a plurality of electromagnetic sensors to emit a magnetic field, detect a resulting magnetic field and emit a detection signal in response at the same; and a control unit arranged to receive the detection signals of the plurality of electromagnetic sensors and to determine a microstructure of a metallic target in the plurality of magnetic sensors.
    [0013] [0013] The plurality of magnetic sensors can be arranged in a direction of movement of the metallic target. The plurality of magnetic sensors can be separated in a cooling area of a metal target production process. The control unit can be arranged to determine a phase change between the emitted magnetic field and the resulting magnetic field for each of the plurality of magnetic sensors. The control unit can be arranged to determine a microstructure evolution of the metallic target.
    [0014] [0014] According to an aspect of the invention, a production process is provided which comprises the system of an aspect of the invention in which the control unit is arranged to emit a signal indicative of the phase transformation of the metallic target and one or more production process parameters are controlled in response to it. The one or more parameters can be parameters of a process for cooling the metal target.
    [0015] [0015] In accordance with one aspect of the invention, a method is provided for monitoring a microstructure of a metallic target which comprises: emitting a magnetic field in a plurality of electromagnetic sensors; detecting a resulting magnetic field in the plurality of magnetic sensors; and determining a microstructure of a metallic target in each of the plurality of magnetic sensors.
    [0016] [0016] The microstructure can be determined based on a phase response of the resulting magnetic field in relation to the emitted magnetic field. The microstructure can be determined based on a magnitude of the resulting magnetic field in relation to the emitted magnetic field. The method may comprise determining a microstructural rate of change in the metallic target. The method may comprise varying one or more parameters of a production process in response to the determined microstructure. The one or more parameters may comprise cooling parameters of the metal target. Brief Description of Drawings
    [0017] [0017] The modalities of the invention will now be described by way of example only with reference to the attached figures in which:
    [0018] [0018] Figure 1 is a schematic of a metal production process or "hot mill";
    [0019] [0019] Figure 2 is an illustration of an electromagnetic sensor from the prior art;
    [0020] [0020] Figure 3 is an exemplary graph of the standardized sensor emitted against the ferrite fraction;
    [0021] [0021] Figure 4 is an illustration of an electromagnetic sensor according to a first embodiment of the invention;
    [0022] [0022] Figure 5 is an illustration of an electromagnetic sensor according to a second embodiment of the invention;
    [0023] [0023] Figure 6 is a schematic of a system according to an embodiment of the invention;
    [0024] [0024] Figure 7 is an illustration of phasors determined in a plurality of signal frequencies;
    [0025] [0025] Figure 8 is an example of a sensor output according to an embodiment of the invention;
    [0026] [0026] Figure 9 is an apparatus according to an additional embodiment of the invention; and
    [0027] [0027] Figure 10 is an illustration of phasors determined from a plurality of sensors according to the modalities of the invention. Detailed Description of the Modalities of the Invention
    [0028] [0028] The modalities of the present invention are intended to reduce the problems associated with monitoring the evolution of a microstructure of a metallic target during the production processing of the metallic target. An example of such processing can be in the case of steel production where hot rolling is followed by controlled cooling. However, it will be understood that the modalities of the present invention are not limited to use with steel targets and can be used with a variety of metals, including ferrous and non-ferrous metal targets. Changes to the steel's microstructure during controlled cooling can be deduced by measuring the material's attached electromagnetic properties. The modalities of the invention will be described with reference to steel processing. However, it is understood that the modalities of the invention can also be useful in monitoring other metals, particularly ferrous metals.
    [0029] [0029] An overview of a metal processing stage, sometimes known as "hot milling", is shown in Figure 1.
    [0030] [0030] Steel 101 that is processed is rolled to a required shape and initial size with one or more successive passes through one or more rolling supports 110. The production process is typically equipped with one or more sensors 120 to measure the thickness, width, shape, etc. and the temperature of the steel. When the steel product exits the last lamination support 110, the steel structure is usually a cubic austenite phase with a centralized face and high temperature.
    [0031] [0031] As steel cools, often in an accelerated cooling process with air, water or oil coolants that can be applied to steel through one or a plurality of outlets 125 located in a controlled cooling zone, the transformations of steel to a structure that consists of the body-centered cubic ferrite and carbide phase, usually cementite (Fe3C), the morphology of the latter depending on the composition and cooling rate. Increasing the cooling rate or alloy content causes a transformation to occur at lower temperatures, generating a finer carbide dispersion and therefore a stronger product. By changing the final microstructures, a wide range of resistances can be produced in the metal product of structures with very low carbon content, essentially ferritic with tensile strengths of around 200 N / mm2 for high strength steels with tensile strengths in excess of 1,000 N / mm2. These have higher carbon contents with microstructures that consist of mixtures of ferrite, perlite, bainite, martensite and, in some cases, known as TRIP steels, austenite that has been stabilized by proper alloy at temperatures below the environment. The cooling process is often monitored or controlled by one or more temperature sensors 140, such as optical pyrometers, which can be positioned before and / or after and occasionally in special zones in the middle of the outlets 125.
    [0032] [0032] It would be useful to monitor the steel structure during the cooling process, such as by sensors within the controlled cooling zone.
    [0033] [0033] Numerous technologies have been proposed to monitor the steel microstructure online, that is, in real time, each with its limitations. Optical temperature sensors are used to implement cooling feedback control, but are adversely affected by water spray variations and surface emissivity irregularities. Additionally, temperature is only a presumed indicator of the microstructure and only the surface of the steel is measured. Other possible approaches such as x-ray diffraction and laser ultrasound have been demonstrated in the laboratory, but they cannot be easily employed in the water cooling zone due to the effects of fog and water spray.
    [0034] 1) Interferências de outros parâmetros de processo, tais como os efeitos da estrutura de aço próxima e variações na suspensão (isto é, a distância entre o cabeçote de sensor e o material) 2) uma faixa de detecção limitada, com a resposta de sensor nivelando para frações de fase ferrítica acima de tipicamente 30% de teor de ferrita. Isso é uma limitação séria conforme a indústria está interessa em controlar a transformação em frações muito maiores 3) a dificuldade de fazer com que um sensor trabalhe a longo prazo nas condições hostis encontradas em um moinho de lamina-ção a quente de aço especialmente com os efeitos desvio térmico por causa das temperaturas elevadas a quais tais sensores teriam que resistir. [0034] Previous attempts to use electromagnetic sensors to monitor the microstructure have been limited by: 1) Interference from other process parameters, such as the effects of the nearby steel structure and variations in the suspension (that is, the distance between the sensor head and the material) 2) a limited detection range, with the sensor response leveling for ferritic phase fractions above typically 30% ferrite content. This is a serious limitation as the industry is interested in controlling the transformation in much larger fractions 3) the difficulty of making a sensor work in the long term in the hostile conditions found in a hot-rolled steel mill especially with the effects of thermal deviation because of the high temperatures that such sensors would have to resist.
    [0035] [0035] Figure 2 shows a prior art sensor unit, generally denoted with the reference numeral 200, to detect electromagnetic properties of a metal target 260.
    [0036] [0036] Typically, the metal target 260 can be moving rapidly over a series of laminations and therefore narrow access to the metal target is restricted to only one side, with, for example, a sensor unit 200 positioned between a pair of rolls.
    [0037] [0037] Sensor unit 200 may contain a magnetic core 210, a source of magnetic excitation 220 and one or more magnetic detectors 230, 240. Magnetic core 210 is configured to apply both an interrogation magnetic field 250 to the metal target 260 as possible and consequently designs based on U 210 shaped cores are preferred. The excitation source 220 can be a permanent magnet or an electromagnet. The detection components 230, 240 are magnetometers and both the induction detector coils and the Hall probe sensor have been reported. The auto switches 230, 240 are fitted to the poles of the magnetic core 210.
    [0038] [0038] Also shown in Figure 2 are two variations in the basic U-core design of sensor 200. The first variation shows an extra pole 270 and the magnetometer, which can be added to provide an extra measurement of the magnetic field 250. The measurements provided by the extra magnetic detector 270 can be used to cancel potential sources of error, such as changes caused by the variation in distance between the sensor unit 200 and the metal target 260. This distance is often referred to as suspension. The second variation is the combination of two extra poles 280, 290 in a back-to-back configuration to make an H-shaped sensor.
    [0039] [0039] EP177626A entitled "System for Online-Detecting Transformation value and / or Flatness of Steel or Magnetic Material" discloses a system for detecting the transformation and / or flattening of a steel or magnetic material online. The system consists of an excitation coil on one side of the metal plate-shaped target with an excitation coil that generates an alternative magnetic field. Two or more detection coils are arranged in different positions at a distance from the excitation coil, but mutually induced with the excitation coil in an arrangement similar to the one shown in Figure 2. The magnetic measurements of the detection coils are fed to a unit arithmetic to obtain the transformation value and the flattening of the metallic target.
    [0040] [0040] Document JP03262957A entitled "Transformation Ratio Measuring Instrument for Steel Material" reveals a system that uses separate magnetic cores of different sizes.
    [0041] [0041] The document EP01308721 entitled "Device and Method for Detecting Magnetic Properties of a Metal Object" reveals a system similar to EP177626A, but in this case a device is described to detect the magnetic properties of a metallic target object. The system comprises a means of generating a magnetic field and a means of detection to measure the effect of a portion of the magnetic field produced by the metallic target. In that case, however, EP01308721 reveals that the generated magnetic field is a continuous DC magnetic field and the detection means are suitable means for detecting at least one continuous component of the magnetic field. The detection means can be positioned on the poles of the sensor unit as shown in Figure 2. In addition to the reported system, it has a non-magnetic metallic shield located between the generation and detection means and the metallic target. Non-magnetic metallic shielding does not affect the DC magnetic field, which is a key feature for using continuous DC magnetic fields instead of alternating AC magnetic fields.
    [0042] [0042] To overcome the problems associated with the magnetization interference of the rollers that carry the metallic target when the metallic target is in the form of a plate or strip, the document JP07325067A entitled "Transformation Factor Measuring Device" reveals a factor measurement device transformation in which the excitation source is provided on one side of a metal target plate and the detection components are provided on the other side of the metal target plate. This approach helps to reduce the magnetizing effects of the roller that carries the metal target plate, but has the disadvantages that different parts of the system are located in different positions making the system more difficult to employ and making the system components more difficult to protect from the fast-moving metal target plate.
    [0043] [0043] A disadvantage of using a sensor unit that employs only a continuous DC excitation or a single frequency excitation is that the measurement system is sensitive to a limited detection range of the transformed fraction of a steel target, with the response leveling sensor unit for ferritic phase fractions above typically 30% ferritic content, as reported in (Yin et al, Journal of Material Science (2007), Volume 42, pages 6854 to 6861, "Exploring the relationship between ferrite fraction and morphology and the electromagnetic properties of steel ") and as shown in Figure 3. This is a serious limitation as the steel industry is interested in controlling the transformation into much larger fractions The document by Yin et al argues that a unit sensor can be used to identify the fraction transformed into steel targets across the full range (0 to 100%) of transformed ferrite fraction using multiple frequency measurements.
    [0044] [0044] JP60017350A discloses a system to quantitatively measure the transformation rate of a steel target using an excitation coil and a detection coil on the same side of the steel target to be measured, passing a variable frequency current to the excitation coil and obtaining a magnetic permeability of the measurement material for the thickness direction of both coils at each frequency.
    [0045] [0045] The use of different frequencies has also been reported by (Dickinson et al, IEEE Transactions on Instrumentation and Measurement (2007), Volume 56 (3), pages. 879 to 886, "The development of a multi-frequency electromagnetic instrument for monitoring the phase transformation of hot strip steel "). This document describes an instrument designed to analyze the phase transformations of the hot steel strip using an electromagnetic sensor. The sensor explores the variations in electrical conductivity and magnetic permeability of steel to monitor the evolution of microstructure during itchy processing. The sensor is an inductive device based on an H-shaped ferrite core, which is interrogated with a multi-frequency impedance analyzer that contains a digital signal processor. The fast Fourier transform online was performed to abstract the inductance changes of multiple frequencies due to the evolution of the sample. An overview of the instrument and measurements of a range of carbon steel samples is presented. The results verify the instrument's ability both to monitor microstructural changes and to reject variations in the suspension distance between the sensor and the hot strip.
    [0046] [0046] JP 2000-304725 entitled "Method for Measuring Thickness of Transformation Layer of Steel Material" also reveals a multi-frequency method for monitoring the progress of the transformation through a metallic target. In this case, the metallic target is thick and the system measures the thickness of the external transformed layer by analyzing the spectra measured by the sensor unit.
    [0047] [0047] However, significant problems exist with the use of such electromagnetic sensors in a metal processing environment. Some embodiments of the invention aim to reduce one or more of such problems so that electromagnetic sensors can be used more reliably and accurately in such environments. There are challenges for the design of an electromagnetic sensor unit. An ideal sensor unit should be able to (i) reject or reduce interference from other process parameters, such as the effects of the nearby steel structure and variations in the suspension, (ii) measure a wide range of transformed fractions, such as a range complete from 0 to 100% of transformed fractions and (iii) having a low sensitivity to variations caused by the high temperature environment with hot metal at temperatures of 1,000 ° C only at a short distance, such as a few cm from the active side of the sensor unit. Some embodiments of the invention may aim to solve or reduce some of these problems.
    [0048] [0048] A first aspect of an embodiment of the invention concerns an apparatus and a method for calibrating an electromagnetic sensor unit. In particular, the first aspect concerns an apparatus and a method for achieving regular calibration during operation of the sensor unit. Frequent calibration of the sensor unit is desirable because of the very high temperature environment encountered when operating with very high radiant heat loads, typically exerted at least in part from the metallic target undergoing the measurement.
    [0049] [0049] Some embodiments of the invention provide an electronic means of applying one or more reference calibration levels to an electromagnetic sensor unit.
    [0050] [0050] Figure 4 illustrates an apparatus 400 according to a first embodiment of the invention. The device is an electromagnetic sensor unit 400 for perceiving a microstructure of a metallic target.
    [0051] [0051] The sensor unit 400 comprises a magnetic core 410, one or more sources of magnetic excitation 420 and one or more magnetic detectors 430. The magnetic core 410 is configured to apply an interrogation magnetic field 440 generated by the source (s) ( s) of excitation 420 to a metallic target (not shown). Metal core 410 can be U-shaped, as shown in Figure 4, or it can be configured as a different shape, such as H-shaped. The excitation source 420 can be a permanent magnet, an electromagnet or a combination of themselves. The auto switch 430 is arranged to detect a 440 magnetic field and can include one or more induction detector coils and / or Hall probe sensors. Other magnetometers are also contemplated. In some embodiments, the sensor unit 400 comprises two auto switches 430, each attached to a corresponding pole of the magnetic core 410. The core 410 can be either U-shaped or H-shaped (the H-shape includes two shaped-cores U arranged with their backs to each other). In some embodiments, the core may be H-shaped and comprise one or more bottom detector coils 445. The sensor unit 400 additionally comprises a calibration unit 450 for calibrating the sensor unit 400.
    [0052] [0052] The calibration unit 450 comprises one or more calibration circuits to generate a calibration magnetic field that interacts with the 440 magnetic field generated by one or more excitation sources 420 to simulate the effect of a metallic target that is present nearby to sensor 400. In some embodiments of the invention, the calibration magnetic field is generated by currents induced in the calibration circuit by the interrogating magnetic field 440. The calibration circuit may comprise a calibration coil 451 to increase the sensitivity of the calibration circuit to the magnetic field 440. Although a calibration coil 451 is shown in Figure 4, it will be understood that the calibration unit 450 can comprise a plurality of calibration coils 451.
    [0053] [0053] The calibration unit 450 may additionally comprise a control or switching means 452 for controlling a 451 calibration coil operation. The control means 452 is shown in Figure 4 as a switch for selectively activating the calibration coil 451 by applying selectively the electric eddy current induced to the calibration coil 451. The control means can be operated in response to a received calibration control signal, as will be discussed. In other embodiments, the control means 452 can be implemented in other ways, such as by a controllable power source or signal generator to generate and selectively apply a voltage or signal to the calibration coil 451. A reference impedance 453 or resistance can be provided in the circuit with the calibration coil 451 to limit a current flow through the calibration coil 451. Alternatively, a limited current output from a power supply or signal generator can be used. Although not shown in Figure 4, a power source can be included in the calibration unit 450 to supply a signal or electrical current to the calibration coil 451, which is selectively applied via switch 452.
    [0054] [0054] Each calibration coil 451 can be positioned around a pole of the magnetic core 410 in order to interact with a portion of the magnetic flux 440 generated by the excitation source 420 that would be applied to the metallic target.
    [0055] [0055] When switch 452 is closed, an electric current can flow around the calibration circuit containing the calibration coil 451 and the reference impedance 453. The calibration unit 450 has an effect on the magnetic sensor similar to that of the flow of eddy currents that would be induced in the metal target by excitation source 420. Consequently, calibration unit 450 can provide a known input to sensor unit 400 that can be used to calibrate sensor unit 400. The calibration unit 450 can be activated manually, such as by user activation of switch switch 452 or automatically, that is, by switch 452, the power source or signal generator that is activated by a control unit, such as a microprocessor or the like.
    [0056] [0056] Figure 5 illustrates an apparatus 500 according to an additional embodiment of the invention. The apparatus 500 comprises an electromagnetic sensor 410, 420, 430, 440, 445 as previously described with reference to Figure 4 and a repeated discussion of similar numbered parts will be omitted for the sake of clarity. Apparatus 500 additionally includes a calibration unit 550 which has a plurality of calibration circuits 551, 552, 553, 554. Each calibration circuit 551, 552, 553, 554 can be considered to be a calibration unit 450 as described above in reference to Figure 4 and the repeated discussion will be again for the sake of clarity. As discussed earlier, each calibration circuit 551, 552, 553, 554 can include one or more calibration coils.
    [0057] [0057] Each of the calibration circuits 551, 552, 553, 554 can be individually controlled to generate a corresponding magnetic field. Each calibration coil can be configured to operate within a respective different calibration frequency range to calibrate the response of the sensor unit 500 in each frequency range. A first calibration coil 551 can be configured to operate within a first calibration frequency range, which is a relatively low frequency range. The configuration may include providing the first 551 calibration coil with one or relatively few turns. Similarly, the reference impedance associated with the first calibration coil 551 can be relatively low. A fourth calibration coil 554 can be configured to operate within a fourth frequency range which is a relatively high calibration frequency range. The configuration may include providing the fourth calibration coil 554 with a relatively large number of turns. The second and third calibration coils 552, 553 can be configured to operate within the respective second and third calibration frequency bands, which can be equally or unevenly spaced between the first and fourth frequency bands. calibration. Although the second embodiment is shown to have four calibration circuits 551, 552, 553, 554, it will be understood that more or less calibration circuits can be provided.
    [0058] [0058] Figure 6 illustrates a system 600 according to an embodiment of the invention. The 600 system is arranged to perceive the microstructure of a metallic target, such as steel being formed in a production process, such as hot grinding.
    [0059] [0059] System 600 comprises an electromagnetic sensor unit 400 as shown in Figure 4 and a control unit 600. The modalities of system 600 can also be contemplated which include sensor unit 500 of Figure 5. In such a case, the Control unit 600 may have a plurality, such as four, of different frequency calibration control signals provided for the four calibration coils.
    [0060] [0060] The control unit 600 comprises a signal unit 610 to generate control and excitation signals and receive detection signals to / from sensor unit 400, respectively. In particular, signal unit 610 can output one or more excitation signals to excitation coil 420 of sensor unit 400 and can receive detection signals from one or more detection coils 430 of sensor unit 400 (the mode shown in Figure 6 comprises an excitation signal provided for an excitation coil 420 and two detection coils 430, although other quantities of excitation coils and detection coils can be contemplated). The signal unit 610 is additionally arranged to output a calibration control signal to the calibration unit 450 to be received by the control means 452 to control the operation of the calibration circuit. The control unit 600 may additionally comprise a signal processing unit 620 to process the detection signals received from the sensor unit 400, as will be explained.
    [0061] [0061] In order to calibrate sensor unit 400, control unit 600 generates an excitation signal for excitation coil 420 of sensor unit 400. The excitation signal can be a time-varying waveform such as as a sine or cosine waveform. The excitation signal can comprise waveforms added together to form a waveform of multiple frequencies. Such waveforms are described in Dickinson et al, IEEE Transactions on Instrumentation and Measurement (2007), Volume 56 (3), pages 879 to 886, which is incorporated by reference in this document, although other waveforms may be used. A driver circuit, although not shown in Figure 6, can be arranged between the output of signal unit 610 and one or more excitation coils 420. Control unit 600 also generates a calibration control signal for the control unit calibration 450. The calibration control signal can control switch 452 in such a way that a circuit is selectively formed that includes the calibration coil 451 or can directly generate a calibration signal applied to the calibration coil, such as a signal that has a frequency f. As a result, a calibration magnetic field is generated. The calibration field effectively modifies the magnetic flux generated by excitation coil 420 to produce a known effect on sensor 400, which is similar to that of the metallic target. The calibration field mimics a flow of eddy currents that would be induced in the metallic target by the excitation signal. The control unit 600 is additionally arranged to receive one or more detector signals from the detection coils 430. The signal unit 610 can digitize each of the received signals and communicate the indicative information of the received signals and the generated excitation signal to the signal processing unit 620.
    [0062] [0062] Based on the information received from the signal unit 610, the signal processing unit 620 converts the digitized signals into phasor equivalents with the use of downward conversion technologies as will be appreciated, as from the cited references. The signal processing unit 620 is arranged to determine the impedance change in the electromagnetic sensor 500 resulting from the metallic target or the calibration field, as will be appreciated by those skilled in the art. The impedance change is determined by having real and imaginary components, that is, as square and in phase components, as shown in Figure 7. These can be determined by the signal processing unit 620 by comparing the coil output voltage waveforms sensing 430 and excitation coil current 420. This can be done in each of a plurality of frequencies of interest, particularly to obtain a depth-dependent profile as higher frequency signals penetrate more deeply into the metallic target. The complex impedance at each frequency can be calculated by the signal processing unit by applying Fast Fourier Transform (FFTs) to the voltage and current waveforms to obtain the phase and magnitude of the respective signals at each separate frequency. An example of multiple frequency measurements is shown in Figure 7 for a non-magnetic metallic target and similar multiple frequency measurements can be obtained by applying the calibration coil arrangement 450, shown in Figure 4.
    [0063] [0063] To calibrate the electromagnetic sensor 400, the signal processing unit 620 is arranged to determine a gradient or sensitivity of the electromagnetic sensor 620 for the output of the calibration unit 450, 550 at one or more frequencies of interest by subtracting a response from the one or more detector coils 430 in the absence of a metal target or output from the calibration unit 450 (a bottom level) of a response from detector coils 430 in the absence of a metal target, but with the calibration unit 450, 550 which generates a known calibration signal.
    [0064] [0064] The operation of the calibration unit can be described as follows. Here, complex phasor notation is used to describe the sensor response. Let Zorn be the sensor's complex impedance output when no metallic target is present and the calibration circuit is not activated at the fn frequency and Zcfn the sensor's complex impedance output when no metallic target is present and the calibration coil is activated, at frequency fn and Zfn the complex impedance output of the sensor when the metallic target is present and the calibration coil is not activated at the frequency fn. The normalized and calibrated sensor output, NNfn can be calculated as follows:
    [0065] [0065] Finally, the calibrated sensor output ZAfn at frequency fn can be additionally calculated as ZAfn = k. NNfn where k is a complex scale factor related to the response of the calibration circuit at frequency fn to the ideal response at that frequency.
    [0066] [0066] Some embodiments of the invention exploit a time interval between metallic targets, that is, when no metallic target is close to the electromagnetic sensor to calibrate the electromagnetic sensor. The time interval, typically a few seconds or more, that occurs in metal production processes, such as hot milling, between the rolling operations on each sheet, linch or metal billet for the final product such as strip, plate, medium sections, rail, rod, etc. as shown in Figure 8. Figure 8 illustrates an exemplary output from an electromagnetic sensor 400, 500 arranged to monitor metal targets produced from a hot grind. Reference numeral 810 denotes an output level when a metallic target is present close to the sensor 400, 500, while 820 denotes an output level when a metallic target is not close to the sensor, that is, the sensor unit is located between successive metal targets and their output is relatively low. It has been understood that a time interval 820 between metal targets may, in some embodiments, present an opportunity to apply one or more known input conditions to a sensor unit to calibrate that sensor unit. A predetermined threshold level 830 can be used by the control unit 600 to determine when the metallic target is not close to the sensor.
    [0067] [0067] In order to calibrate the sensor 400, 500 both a zero (background) and a predetermined reference level can be applied to the sensor unit 400, 500. The zero reference level can be obtained directly during the time interval between lamination operations when no material is present, that is, without any exit from the calibration coil. The predetermined reference level corresponds to an output from one or more calibration coils. In the prior art, this was achieved by positioning a reference sample of the material with known electromagnetic properties close to the sensor unit. However, this is difficult or inconvenient to achieve in a short period of time and / or on a regular basis, such as between metal targets that are produced by hot grinding.
    [0068] [0068] Figure 9 illustrates an apparatus 900 according to an additional modality of the invention. The 900 device is arranged to determine a time-dependent profile of the electromagnetic properties of a 950 metal target. In particular, the 900 device can be used to determine or monitor the evolution of the 950 metallic electromagnetic properties as it cools following a production process. hot, such as hot rolling.
    [0069] [0069] Apparatus 900 includes a plurality of electromagnetic sensors 911, 912, 913 ... 91 n. Each electromagnetic sensor 911, 912, 913 ... 91 n can be as previously described with reference to Figure 4 or 5. However, it will be appreciated that each electromagnetic sensor 911, 912, 913 ... 91 n may not comprise a unit of calibration 450, 550. That is, some modalities of the invention include electromagnetic sensors that do not comprise a calibration unit or circuit, although it is understood that modalities that comprise can be contemplated.
    [0070] [0070] System 900 additionally comprises a plurality of control units 921, 922, 923, 92n, each associated with a respective electromagnetic sensor 911, 912, 913 ... 91 n to determine a sensor phase response respective electromagnetic 913 ... 91 n for the metallic target. The control units can be individually formed, that is, arranged separately to provide an output to a monitoring system each, or they can be arranged as shown in Figure 9 where each control unit is a component part of a monitoring system. control 920. When formed in a combined manner, as shown in Figure 9, the same may be possible to reduce a total number of components through the reuse of some subsystems. Control units 921, 922, 923, 92n can be as shown in and described with reference to Figure 6. However, each of the control units 921, 922, 923, 92n may not comprise an output to control a calibration unit. 450, 550. Each control unit 921, 922, 923, 92n can comprise one or more excitation signal outputs and one or more detector signal inputs to determine the phase response of the electromagnetic sensor as close to the metal target. Each control unit 921, 922, 923, 92n is arranged to determine a change in the structure of the metallic target using the respective electromagnetic sensor 911, 912, 913 ... 91n.
    [0071] [0071] The electromagnetic sensors 911, 912, 913 ... 91 n cannot be arranged close to a path of the metallic target through one or more cooling zones, as explained above. The cooling zones may include means for controllably cooling the metal target. The means for controllably cooling the metal target may include one or more means for applying a fluid to the metal target, such as air or other gases or liquids, such as water or oil. As the metallic target is moved in a lamination direction (shown in Figure 10) it passed through a first electromagnetic sensor 911. Responsive to an excitation signal generated by the respective control unit 921 one or more detection signals are received . The excitation signal can include a plurality of frequency components, as indicated in Figure 10, although the presence of these components of multiple frequencies and the number of them are not limiting. The first control unit 921 is arranged to determine a phase response of the electromagnetic sensor at each frequency of the excitation signal. Similarly, as the metallic target progresses beyond each of the second, third and fourth electromagnetic sensors 912, 913, 914, the respective control unit is arranged to determine the sensor response at each excitation signal frequency and the response of blown phase, as shown in Figure 10.
    [0072] [0072] It can be seen in Figure 10, although the phase diagrams for each sensor are for illustration only and are not to scale, that the four phasors illustrated are gradually rotated clockwise indicating the development or evolution of the metallic target structure as it cools. The 920 control system can therefore determine the development of the metallic target in real time. Based on the determined rate of development, the control system 920 may be arranged to output a signal 930 indicative of structural development to a processor controller 940 arranged to control the metal production process. The signal can indicate a deviation from the structural development of the metallic target from a predetermined structural development rate, such that the process controller 940 can vary one or more parameters of the production process to optimize the structural development of the metallic target. For example, if signal 930 indicates that the metal target structure is forming as a result of cooling more quickly than desired, the process controller can reduce a rate of fluid flow towards the metal target, such as by reducing water flow rate from outlets 125 described above. In this way, the cooling of the metallic target can be delayed at a desired rate. In this way, the qualities resulting from the metallic target can be controlled by real-time monitoring of the structural changes of the metallic target.
    [0073] [0073] It will be seen from the discussion above that some modalities of the invention allow for the convenient calibration of electromagnetic sensors. Particularly, in some modalities, the calibration can be carried out in a period automatically determined between the metallic targets. In some embodiments, an array of electromagnetic sensors is used to determine an evolution of a microstructure from a metallic target. By such monitoring, the properties of the metallic target can be controlled.
    [0074] [0074] It will be appreciated that the modalities of the present invention can be carried out in the form of hardware, software or a combination of hardware and software. Any such software can be stored in the form of volatile or non-volatile storage such as, for example, a storage device such as a ROM, or downloadable or rewritable or not, or in the form of a memory such as, for example, RAM, memory chips, device or integrated circuits or in an optically or magnetically readable medium such as, for example, a CD, DVD, magnetic disk or magnetic tape. It will be appreciated that storage devices and storage media are machine-readable storage modalities that are suitable for storing a program or programs that, when executed, implement the modalities of the present invention. Consequently, the modalities provide a program comprising a code for implementing a system or method as claimed in any embodiment and machine-readable storage that stores such a program. Still further, the modalities of the present invention can be conducted electronically by any means such as a communication signal loaded over a wired or wireless connection and the modalities adequately cover the same.
    [0075] [0075] All the resources described in this specification (including any embodiments, summary and attached drawings) and / or all the steps of any method or process so described can be combined in any combination, except combinations in which at least some of them resources and / or steps are mutually exclusive.
    [0076] [0076] Each resource described in this specification (including any embodiments, summary and attached drawings) may be replaced by alternative resources serving the same or equivalent or similar purpose, unless expressly reported otherwise. Thus, unless expressly reported otherwise, each feature described is an example of only a generic series of equivalent or similar features.
    [0077] [0077] The invention is not restricted to the details of any previous modalities. The invention extends to any innovative feature or any innovative combination of the features described in this specification (including any embodiments, summary and accompanying drawings) or any innovative step or any innovative combination of the steps of any method or process described. The embodiments should not be interpreted to cover only the previous modalities, but also any modalities that are within the scope of the embodiments.
    权利要求:
    Claims (11)
    [0001]
    System for monitoring a microstructure of a metallic target, characterized by the fact that it comprises a plurality of electromagnetic sensors (911, 912, 913, ..., 91 n) to emit a magnetic field, in which an excitation signal emitted by each of the electromagnetic sensors is a multiple frequency waveform that detects a field resulting magnetic signal and emits a detection signal in response to it; a control unit (920) arranged to receive the detection signals from the plurality of electromagnetic sensors (911,912, 913, ..., 91n), to determine a phase change between the emitted magnetic field and the resulting magnetic field each of a plurality of frequencies that form the waveform of multiple frequencies for each of the plurality of electromagnetic sensors (911, 912, 913, ..., 91 n), to determine a microstructure development rate of a metallic target in the plurality of electromagnetic sensors (911, 912, 913, ..., 91 n) based on phase changes, and to determine a deviation from the microstructure development rate from a predetermined microstructure development rate.
    [0002]
    System according to claim 1, characterized by the fact that the plurality of electromagnetic sensors (911, 912, 913, ..., 91 n) is arranged in a direction of movement of the metallic target.
    [0003]
    System according to claim 1 or 2, characterized by the fact that the plurality of electromagnetic sensors (911, 912, 913 91 n) is spaced in a cooling area of a metal target production process.
    [0004]
    System according to any one of claims 1 to 3, characterized by the fact that the control unit (920) is arranged to determine a microstructure evolution of the metallic target.
    [0005]
    Production process comprising the system as defined in any of claims 1 to 4, characterized by the fact that the control unit is arranged to emit a signal indicative of the deviation from the microstructure development rate of the metallic target, the production process comprising a processor to control the production process, wherein the processor is arranged to receive the signal indicating the deviation and to control one or more parameters of the production process in response to it.
    [0006]
    Production process, according to claim 5, characterized by the fact that the one or more parameters are parameters of a process for cooling the metallic target.
    [0007]
    Method for monitoring a microstructure of a metallic target, characterized by the fact that it comprises emitting a magnetic field generated in response to a waveform of multiple frequencies to a plurality of electromagnetic sensors (911,912, 913, ..., 91 n); detecting a resulting magnetic field in the plurality of electromagnetic sensors (911, 912, 913, ..., 91 n); determining a phase response of the resulting magnetic field in relation to the magnetic field emitted in each of a plurality of frequencies that form the waveform of multiple frequencies; determining a rate of microstructure development of a metallic target in each of the plurality of electromagnetic sensors (911, 912, 913 91 n) based on the phase response; and determining a deviation from the rate of microstructure development from a predetermined rate of microstructure development.
    [0008]
    Method, according to claim 7, characterized by the fact that the microstructure is determined based, additionally, on a magnitude of the resulting magnetic field in relation to the emitted magnetic field.
    [0009]
    Method according to claim 7 or 8, characterized in that it comprises determining a microstructural rate of change of the metallic target.
    [0010]
    Method according to claim 7 or 8, characterized by the fact that it comprises varying one or more parameters of a production process in response to the determined microstructure.
    [0011]
    Method according to claim 10, characterized by the fact that the one or more parameters comprise cooling parameters of the metallic target.
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    同族专利:
    公开号 | 公开日
    ES2773519T3|2020-07-13|
    US20140049251A1|2014-02-20|
    GB2481482A|2011-12-28|
    CN103635798B|2017-02-15|
    DK3203224T3|2020-03-02|
    KR20140053895A|2014-05-08|
    JP2017021042A|2017-01-26|
    US9404992B2|2016-08-02|
    RU2013152616A|2015-06-10|
    WO2012146930A2|2012-11-01|
    GB201107064D0|2011-06-08|
    RU2593677C2|2016-08-10|
    CN106772139A|2017-05-31|
    CA3069899C|2021-11-30|
    RU2016126594A|2018-12-05|
    BR112013027621A2|2017-02-14|
    JP2014513296A|2014-05-29|
    EP2702402A2|2014-03-05|
    PL3203224T3|2020-06-01|
    EP3203224B1|2019-11-27|
    CA2871131C|2021-01-12|
    EP3203224A1|2017-08-09|
    US10144987B2|2018-12-04|
    JP6010606B2|2016-10-19|
    CN106772139B|2020-02-07|
    DK2702402T3|2017-07-17|
    CN103635798A|2014-03-12|
    ES2629318T3|2017-08-08|
    RU2712981C2|2020-02-03|
    GB2481482B|2012-06-20|
    CA2871131A1|2012-11-01|
    KR101941241B1|2019-01-22|
    EP2702402B1|2017-04-12|
    US20160289789A1|2016-10-06|
    JP6472778B2|2019-02-20|
    RU2016126594A3|2019-09-03|
    CA3069899A1|2012-11-01|
    PL2702402T3|2017-09-29|
    WO2012146930A3|2013-06-20|
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    法律状态:
    2018-12-11| B06F| Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]|
    2019-09-17| B06U| Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette]|
    2020-05-19| B07A| Application suspended after technical examination (opinion) [chapter 7.1 patent gazette]|
    2020-09-08| B09A| Decision: intention to grant [chapter 9.1 patent gazette]|
    2020-11-24| B16A| Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]|Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 27/04/2012, OBSERVADAS AS CONDICOES LEGAIS. |
    优先权:
    申请号 | 申请日 | 专利标题
    GB1107064.6|2011-04-27|
    GB1107064.6A|GB2481482B|2011-04-27|2011-04-27|Improvements in sensors|
    PCT/GB2012/050930|WO2012146930A2|2011-04-27|2012-04-27|Improvements in sensors|
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